Hydrogen plasma microlithography of graphene supported on a Si/SiO2 substrate

Applied Physics Letters 102 (2013) 071602

Baran Eren, Thilo Glatzel, Marcin Kisiel, Wangyang Fu, Rémy Pawlak, Urs Gysin, Cornelia Nef, Laurent Marot, Michel Calame, Christian Schönenberger, Ernst Meyer

Nanosurf FlexAFM was employed for Kelvin Probe Force Microscopy characterization of untreated and patterned single layer graphene.

Recommended instrument